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Drying of photoresist patterns on semiconductor wafers using amine acetate surfactants in supercritical carbon dioxide

Kwon Taek Lim,Ha Su Hwang,Hyun Jung Kim

Journal of Korean Society for Imaging Science and Technology :: Vol.25 No.2 pp.34-40

DOI:http://dx.doi.org/10.14226/KSIST.2019.25.02.1
Open abstract
Supercritical carbon dioxide drying for MEMS structures

Kwon Taek Lim^*, Dong Woo Kim, Yong Hun Kim

Journal of Korean Society for Imaging Science and Technology :: Vol.20 No.4 pp.16-21

DOI:https://doi.org/10.14226/KSIST.2014.20.4.03
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