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ISSN : 1226-0517(Print)
ISSN : 2288-9604(Online)
Journal of Korean Society for Imaging Science and Technology Vol.20 No.4 pp.16-21
DOI : https://doi.org/10.14226/KSIST.2014.20.4.03

초임계 이산화탄소를 이용한 MEMS 구조물의 건조 기술

김동우, 김용훈, 임권택*
608-737 부산광역시 남구 용소로 45 부경대학교 이미지시스템공학과

Supercritical carbon dioxide drying for MEMS structures

Kwon Taek Lim*, Dong Woo Kim, Yong Hun Kim

Department of Image Science & Engineering, Pukyong National University Daeyeon Campus (608-737) 45, Yongso-ro, Nam-Gu. Busan, Korea

Abstract

Supercritical carbon dioxide (scCO2) drying for a MEMS structure of high aspect ratio wasinvestigated to tackle the limitation of conventional drying method of the wet etching process. The MEMSstructure of cantilever beams were released by a HF/water etchant solution. The aqueuous solution wasreplaced with isopropyl alcohol followed by replacement with scCO2. The removal of isopropyl alcohol usingscCO2 in various experimental conditions was investigated by a volatile organic compound analysis. Themorphology of cantilever beam was observed by scanning electron microscopy. The conventional dryingtechnique produced cantilever beams without stiction below aspect ratio of 1:15, whereas scCO2 dryingtechnique presented a good performance at high aspect ratio of 1:75 without stiction.

 

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