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Supercritical carbon dioxide drying for MEMS structures

Kwon Taek Lim^*, Dong Woo Kim, Yong Hun Kim

Journal of Korean Society for Imaging Science and Technology :: Vol.20 No.4 pp.16-21

DOI:https://doi.org/10.14226/KSIST.2014.20.4.03
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Improved etching method of silicon dioxide in supercritical carbon dioxide

Kwon Taek Lim^†, Sung Hyun Yoon, Yong Hoon Kim

Journal of Korean Society for Imaging Science and Technology :: Vol.19 No.2 pp.8-18

DOI:
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