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Dry etching of high aspect ratio cantilever structures using alcoholic co-solvents and hydrofluoric acid in supercritical CO2

Sang Ho Lee, Yong Hun Kim, Yong Han Kim, Kwon Taek Lim

Journal of Korean Society for Imaging Science and Technology :: Vol.21 No.3 pp.1-6

DOI:https://doi.org/10.14226/KSIST.2015.21.3.01
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Supercritical carbon dioxide drying for MEMS structures

Kwon Taek Lim^*, Dong Woo Kim, Yong Hun Kim

Journal of Korean Society for Imaging Science and Technology :: Vol.20 No.4 pp.16-21

DOI:https://doi.org/10.14226/KSIST.2014.20.4.03
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