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Drying of photoresist patterns on semiconductor wafers using amine acetate surfactants in supercritical carbon dioxide

Kwon Taek Lim,Ha Su Hwang,Hyun Jung Kim

Journal of Korean Society for Imaging Science and Technology :: Vol.25 No.2 pp.34-40

DOI:http://dx.doi.org/10.14226/KSIST.2019.25.02.1
Open abstract
Preparation and characterization of water-based paints via introduction of metal nanoparticles

Won-Tae Choi, Kwon-Taek Lim, Ha-Su Kim

Journal of Korean Society for Imaging Science and Technology :: Vol.24 No.3 pp.1-6

DOI:http://dx.doi.org/10.14226/KSIST.2018.24.03.1
Open abstract
Preparation of Surface Modified Silica nanoparticles with Silane Coupling Agent in Supercritical Carbon Dioxide

Won-Tae Choi,Kwon-Taek Lim,Ha-Su Kim

Journal of Korean Society for Imaging Science and Technology :: Vol.23 No.4 pp.47-51

DOI:http://dx.doi.org/10.14226/KSIST.2017.23.04.8
Open abstract
Dry etching of high aspect ratio cantilever structures using alcoholic co-solvents and hydrofluoric acid in supercritical CO2

Sang Ho Lee, Yong Hun Kim, Yong Han Kim, Kwon Taek Lim

Journal of Korean Society for Imaging Science and Technology :: Vol.21 No.3 pp.1-6

DOI:https://doi.org/10.14226/KSIST.2015.21.3.01
Open abstract
Supercritical carbon dioxide drying for MEMS structures

Kwon Taek Lim^*, Dong Woo Kim, Yong Hun Kim

Journal of Korean Society for Imaging Science and Technology :: Vol.20 No.4 pp.16-21

DOI:https://doi.org/10.14226/KSIST.2014.20.4.03
Open abstract

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