:: Journal of Korean Society for Imaging Science and Technology ::

About US +
For Contributors +
- Instruction For Authors
- Ethics Guideline
Journal Search +

Journal Search Engine

Dry etching of high aspect ratio cantilever structures using alcoholic co-solvents and hydrofluoric acid in supercritical CO2

Sang Ho Lee, Yong Hun Kim, Yong Han Kim, Kwon Taek Lim

Journal of Korean Society for Imaging Science and Technology :: Vol.21 No.3 pp.1-6

DOI:https://doi.org/10.14226/KSIST.2015.21.3.01
Open abstract
Improved etching method of silicon dioxide in supercritical carbon dioxide

Kwon Taek Lim^†, Sung Hyun Yoon, Yong Hoon Kim

Journal of Korean Society for Imaging Science and Technology :: Vol.19 No.2 pp.8-18

DOI:
Open abstract

Copyright © Korean Society for Imaging Science and Technology. All rights reserved.