Volume.25 No.2 June 2019

• Drying of photoresist patterns on semiconductor wafers using amine acetate surfactants in supercritical carbon dioxide

  Kwon Taek Lim,Ha Su Hwang,Hyun Jung Kim

  Journal of Korean Society for Imaging Science and Technology :: Vol.25 No.2 pp.34-40

  DOI:http://dx.doi.org/10.14226/KSIST.2019.25.02.1

  Open abstract

• Synthesis and Properties of Poly[4-(trifluoroacetoxy)methyl-1,6-heptadiyne]

  Seung-Hwan Jeong,Kwon Teak Lim,Sung-Ho Jin,Yeong-Soon Gal

  Journal of Korean Society for Imaging Science and Technology :: Vol.25 No.2 pp.41-51

  DOI:http://dx.doi.org/10.14226/KSIST.2019.25.02.2

  Open abstract